Journal Papers

     

    1. L. Zhang, J. Liu, W. Gong, H. Jiang, and S. Liu, "Diffraction based single pulse measurement of air ionization dynamics induced by femtosecond laser," Opt. Express 29, 18618-18627 (2021).URL, PDF)

    2. M. Fang, Z. Wang, H. Gu, B. Song, Z. Guo, J. Zhu, X. Chen, C. Zhang, H. Jiang, and S. Liu, "Complex optical conductivity of Bi2Se3 thin film: Approaching two-dimensional limit," Appl. Phys. Lett. 118, 191101 (2021).URL, PDF)

    3. S. Hou, Z. Guo, J. Yang, Y. Liu, W. Shen, C. Hu, S. Liu, H. Gu, and Z. Wei, "Birefringence and dichroism in quasi-1D transition metal trichalcogenides: Direct experimental investigation," Small 17, 2100457 (2021).URL, PDF)

    4. B. Song, H. Gu, M. Fang, Z. Guo, Y.Ho, X. Chen, H. Jiang, and S. Liu, "2D Niobium-doped MoS2: Tuning the exciton transitions and potential applications," ACS Appl. Electron. Mater. 3, 2564-2572 (2021).URL, PDF)

    5. Z. Guo, H. Gu, M. Fang, B. Song, W. Wang, X. Chen, C. Zhang, H. Jiang, L. Wang, and S. Liu, "Complete dielectric tensor and giant optical anisotropy in quasi-one-dimensional ZrTe5," ACS Mater. Lett. 3, 525-534 (2021).URL, PDF)

    6. B. Song, J. Hou, H. Wang, S. Sidhik, J. Miao, H. Gu, H. Zhang, S. Liu, Z. Fakhraai, J. Even, J. Blancon, A. Mohite, and D. Jariwala, "Determination of dielectric functions and exciton oscillator strength of two-dimensional hybrid perovskites," ACS Materials Lett. 3, 148-159 (2021)URL, PDF)

    7. L. Zhang, J. Liu, Z. Zhong, H. Jiang, H. Gu, X. Chen, S. Liu, "Beam collapse and refractive index changes inside fused silica induced by loosely focused femtosecond laser," J. Opt. 23, 075402 (2021).URL, PDF)

    8. M. Wang, F. Liu, H. Jiang, and S. Liu, "Effective medium approximation based interpretation for Mueller matrix spectra of polydimethylsiloxane gratings," J. Opt. 23, 025403 (2021).URL, PDF)

    9. C. Feng, S. Liu, J. Li, M. Li, S. Cheng, C. Chen, T. Shi, and Z. Tang, "Molecular understanding of electrochemical–mechanical responses in carbon-coated silicon nanotubes during lithiation," Nanomaterials 11, 564 (2021).URL, PDF)

    10. K. Zheng, H. Wang, P. Xu, H. Gu, B. Tu, W. Wang, S. Liu, and Z. Fu, "Effect of nitrogen content on optical properties of transparent γ-AlON polycrystalline ceramics," J. Eur. Ceram. Soc. 41, 4319-4326 (2021)URL, PDF)

    11. B. Song, F. Liu, H. Wang, J. Miao, Y. Chen, P. Kumar, H. Zhang, X. Liu, H. Gu, E. A. Stach, X. Liang, S. Liu, Z. Fakhraai, and D. Jariwala, "Giant gate-tunability of complex refractive index in semiconducting carbon nanotubes," ACS Photon. 7, 2896-2905 (2020).URL, PDF)

    12. J. Liu, M. Wang, H, Jiang, H. Gu, X. Chen, and S. Liu, "Annealing temperature dependency of optical and structural properties for Cu films," Phys. Rev. B 101, 014107 (2020).URL, PDF)

    13. J. Liu, H. Jiang, L. Zhang, H. Gu, X. Chen, and S. Liu, "Thickness dependent native oxidation kinetics observation and prediction for Cu films using spectroscopic ellipsometry," Appl. Surf. Sci. 518, 146236 (2020).URL, PDF)

    14. M. Fang, Z. Wang, H. Gu, M. Tong, B. Song, X. Xie, T. Zhou, X. Chen, H. Jiang, T. Jiang, and S. Liu, "Layer-dependent dielectric permittivity of topological insulator Bi2Se3 thin films," Appl. Surf. Sci. 509, 144822 (2020).(URL, PDF)

    15. H. Gu, S. Zhu, B. Song, M. Fang, Z. Guo, X. Chen, C. Zhang, H. Jiang, and S. Liu, "An analytical method to determine the complex refractive index of an ultra-thin film by ellipsometry," Appl. Surf. Sci. 507, 145091 (2020).URL, PDF)

    16. S. Zhang, H. Jiang, H. Gu, X. Chen, and S. Liu, "Attitude metrology based on field-of-view effect of birefringence using high-speed polarimetry," Opt. Lett. 45, 2074-2077 (2020).URL, PDF)

    17. Z. Dong, H. Gu, J. Zhu, Y. Shi, L. Nie, J. Lyu, X. Chen, H. Jiang, and S. Liu, "Nonuniform depolarization properties of typical nanostructures and potential applications," Opt. Lett. 45, 1910-1913 (2020).URL, PDF)

    18. X. Ke, H. Gu, L. Chen, X. Zhao, J. Tian, Y. Shi, X. Chen, C. Zhang, H. Jiang, and S. Liu, "Multi-objective collaborative optimization strategy for efficiency and chromaticity of stratified OLEDs based on an optical simulation method and sensitivity analysis," Opt. Express 28, 27532-27546 (2020).URL, PDF)

    19. S. Zhang, H. Jiang, H. Gu, X. Chen, and S. Liu, "High-speed Mueller matrix ellipsometer with microsecond temporal resolution," Opt. Express 28, 10873-10887 (2020).URL, PDF)

    20. C. Wang, X. Chen, H. Gu, H. Jiang, C. Zhang, and S. Liu, "On the limit of low-numerical-aperture imaging scatterometry," Opt. Express 28, 8445-8462 (2020).URL, PDF)

    21. X. Zhao, R. Xia, H. Gu, X. Ke, Y. Shi, X. Chen, H. Jiang, H.-L. Yip, and S. Liu, "Performance optimization of tandem organic solar cells at varying incident angles based on optical analysis method," Opt. Express 28, 2381-2397 (2020).URL, PDF)

    22. Z. Yang, X. Chen, H. Jiang, and S. Liu, "Fast reconstruction of the aberrated scanning lithographic image by a quadratic imaging model and an integral transfer function," Appl. Opt. 59, 4708-4717 (2020).URL, PDF)

    23. Y. Shi, K. Li, X. Chen, P. Wang, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Multi-objective optimization for target designin diffraction-based overlay metrology," Appl. Opt. 59, 2897-2905 (2020).URL, PDF)

    24. Z. Zhong, L. Zhang, H. Jiang, H. Gu, X. Chen, C. Zhang, and S. Liu, "Improved Fourier transformation based method for accurate phase and amplitude retrieval in spectral interferometry," J. Opt. 22, 035501 (2020).URL, PDF)

    25. Z. Zhong, L. Zhang, H. Jiang, W. Gong, H. Gu, X. Chen, and S. Liu, "A Brewster incidence method for shocked dynamic metrology of transparent materials and its error evaluation," AIP Adv. 10, 105203 (2020).URL, PDF)

    26. Z. Zhong, W. Gong, H. Jiang, H. Gu, X. Chen, and S. Liu, "Investigation of spatial chirp induced by misalignments in a parallel grating pair pulse stretcher," Appl. Sci. 10, 1584 (2020).URL, PDF)

    27. S. Zhang, L. Wang, A. Yi, H. Gu, X. Chen, H. Jiang, and S. Liu, "Dynamic modulation performance of ferroelectric liquid crystal polarization rotators and Mueller matrix polarimeter optimization," Front. Mech. Eng. 15, 256-264 (2020).URL, PDF)

    28. L. Qiu, S. Wei, H. Xu, Z. Zhang, Z. Guo, X. Chen, S. Liu, D. Wu, and L. Luo, "Ultrathin polymer nanofibrils for solar-blind deep ultraviolet light photodetectors application," Nano Lett. 20, 644-651 (2020).(URL, PDF)

    29. X. Zong, H. Gu, L. Ren, B. Tu, W. Wang, S. Liu, and Z. Fu, "A novel spinel-type Mg0.55Al2.36O3.81N0.19 transparent ceramic with infrared transmittance range comparable to c-plane sapphire," Scr. Mater. 178, 428-432 (2020). URL, PDF)

    30. H. Gu, B. Song, M. Fang, Y. Hong, X. Chen, H. Jiang, W. Ren, and S. Liu, "Layer-dependent dielectric and optical properties of centimeter-scale 2D WSe2: evolution from a single layer to few layers," Nanoscale 11, 22762-22771 (2019).URL, PDF)

    31. B. Song, H. Gu, M. Fang, Y.-T. Ho, X. Chen, H. Jiang, and S. Liu, "Complex optical conductivity of 2D MoS2: a striking layer-dependency," J. Phys. Chem. Lett. 10, 6246-6252 (2019).URL, PDF)

    32. X. Ke, H. Gu, X. Zhao, X. Chen, Y. Shi, C. Zhang, H. Jiang, and S. Liu, "Simulation method for study on outcoupling characteristics of stratified anisotropic OLEDs," Opt. Express 27, A1014-A1029 (2019).URL, PDF)

    33. H. Gu, X. Chen, H. Jiang, Y. Shi, and S. Liu, "Wide field-of-view angle linear retarder with ultra-flat retardance response," Opt. Lett. 44, 3026-3029 (2019).URL, PDF)

    34. B. Song, H. Gu, M. Fang, X. Chen, H. Jiang, R. Wang, T. Zhai, Y. Ho, and S. Liu, "Layer-dependent dielectric function of wafer-scale 2D MoS2," Adv. Opt. Mater.7, 1801250 (2019).URL, PDF)

    35. H. Jiang, H. Peng, G. Chen, H. Gu, X. Chen, Y. Liao, S. Liu, and X. Xie, "Nondestructive investigation on the nanocomposite ordering upon holography using Mueller matrix ellipsometry," Eur. Polym. J. 110, 123-129 (2019). URL, PDF)

    36. Z. Zhou, H. Jiang, H. Gu, X. Chen, H. Peng, Y. Liao, S. Liu, and X. Xie, "Strain-optical behavior of polyethylene terephthalate film during uniaxial stretching investigated by Mueller matrix ellipsometry," Polymer 182, 121842 (2019). URL, PDF)

    37. X. Chen, J. Liao, H. Gu, Y. Shi, H. Jiang, S. Liu, "Proof of principle of an optical Stokes absolute roll-angle sensor with ultra-large measuring range," Sens. Actuat, A 291, 144-149 (2019). (URL, PDF)

    38. Z. Dong, X. Chen, X. Wang, Y. Shi, H. Jiang, and S. Liu, "Dependence-analysis-based data-refinement in optical scatterometry for fast nanostructure reconstruction,” Appl. Sci. 9, 4091 (2019). (URL, PDF)

    39. H. Jiang, Z. Ma, H. Gu, X. Chen, and S. Liu, "Characterization of volume gratings based on distributed dielectric constant model using Mueller matrix ellipsometry," Appl. Sci. 9, 698 (2019). URL, PDF)

    40. C. Chen, X. Chao; H. Gu, H. Jiang, C. Zhang, S. Liu, "Calibration of polarization effect of a high-numerical-aperture objective lens with Mueller matrix polarimetry," Meas. Sci. Technol.30, 025201 (2019).URL, PDF)

    41. Z. Yang, X. Chen, H. Jiang, and S. Liu, "In-line wavefront aberration adjustment of a projection lens for a lithographic tool using the dominant mode method," Appl. Opt. 58, 4176-4184 (2019).URL, PDF)

    42. J. Liu, J. Lin, H. Jiang, X. Chen, C. Zhang, G. Liao, and S. Liu, "Characterization of dielectric function for metallic thin films based on ellipsometric parameters and reflectivity," Phys. Scr. 94, 085802 (2019).URL, PDF)

    43. S. Zhang, C. Chen, H. Jiang, H. Gu, X. Chen, C. Zhang, and S. Liu, "Dynamic characteristics of nematic Liquid Crystal Variable Retardere (LCVRs) investigated by a high-speed polarimetry, J. Opt. 21, 065605 (2019).URL, PDF)

    44. C. Mao, H. Li, H. Gu, J. Wang, Y. Zou, G. Qi, J. Xu, F. Deng, W. Shen, J. Li, S. Liu, J. Zhao, and L. Zhang, "Beyond the thermal equilibrium limit of ammonia synthesis with dual temperature zone catalyst powered by solar light,"Chem 5, 2702-2717 (2019).URL, PDF)

    45. J. Qu, B. Li, Y. Shen, S. Huo, Y. Xu, S. Liu, B. Song, H. Wang, C. Hu, and W. Feng, "Evaporable glass-state molecules-assisted transfer of clean and intact graphene onto arbitrary substrates," ACS Appl. Mater. Interf. 11, 16272-16279 (2019). URL, PDF)

    46. R. Xia, H. Gu, S. Liu, K. Zhang, H.-L. Yip, and Y. Cao, "Optical analysis for semitransparent organic solar cells," Sol. RRL 3, 1800270 (2019).URL, PDF)

    47. X. Liu, L. Hu, R. Wang, J. Li, H. Gu, S. Liu, Y. Zhou, and G. Tu, "Flexible perovskite solar cells via surface-confined silver nanoparticles on transparent polyimide substrates," Polymers 11, 427 (2019). (URL, PDF)

    48. X. Zong, H. Wang, H. Gu, L. Ren, S. Guo, B. Tu, W. Wang, S. Liu, and Z. Fu, "Highly transparent Mg0.27Al2.58O3.73N0.27 ceramic fabricated by aqueous gelcasting, pressureless sintering and post-HIP," J. Am. Ceram. Soc.102,6507-6516 (2019). (URL, PDF)

    49. D. Qi, X. Wang, F. Chen, H. Gu, S. Liu, and R. Gong, "Valid corollaries of polarization separated color attributes for multi-layer dielectric structure," Phys. Scr. 94, 115007 (2019). (URL, PDF)

    50. C. Chen, X. Chen, Y. Shi, H. Gu, H. Jiang, and S. Liu, "Metrology of nanostructures by tomographic Mueller-matrix scatterometry," Appl. Sci. 8, 2583 (2018). URL, PDF)

    51. S. Zhang, H. Gu, J. Liu, H. Jiang, X. Chen, C. Zhang, and S. Liu, "Characterization of beam splitters in the calibration of a six-channel Stokes polarimeter," J. Opt. 20, 125606 (2018). URL, PDF)

    52. H. Gu, X. Chen, Y. Shi, H. Jiang, C. Zhang, P. Gong, and S. Liu, "Comprehensive characterization of a general composite waveplate by spectroscopic Mueller matrix polarimetry," Opt. Express 26, 25408-25425 (2018). URL, PDF)

    53. Y. Tan, C. Chen, X. Chen, W. Du, H. Gu, and S. Liu, "Development of a tomographic Mueller-matrix scatterometer for nanostructure metrology," Rev. Sci. Instrum. 89, 073702 (2018). URL, PDF)

    54. X. Chen, Z. Tao, C. Chen, C. Wang, L. Wang, H. Jiang, D. Fan, Y. Ekinci, and S. Liu, "All-dielectric metasurface-based roll-angle sensor," Sens. Actuat. A 279, 509–517 (2018).URL, PDF)

    55. J. Liu, C. Zhang, Z. Zhong, H. Gu, X. Chen, H. Jiang, and S. Liu, "Measurement configuration optimization for dynamic metrology using Stokes polarimetry," Meas. Sci. Technol. 29, 054010 (2018). (URL, PDF)

    56. X. Chen, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Probing optimal measurement configuration for optical scatterometry by the multi-objective genetic algorithm,” Meas. Sci. Technol. 29, 045014 (2018). (URL, PDF)

    57. B. Song, H. Gu, S. Zhu, H. Jiang, X. Chen, C. Zhang, and S. Liu, "Broadband optical properties of graphene and HOPG investigated by spectroscopic Mueller matrix ellipsometry," Appl. Surf. Sci. 439, 1079-1087 (2018). (URL, PDF)

    58. H. Gu, X. Chen, C. Zhang, H. Jiang, and S. Liu, "Study of the retardance of a birefringent waveplate at tilt incidence by Mueller matrix ellipsometer," J. Opt. 20, 015401 (2018). (URL, PDF)

    59. G. Zhang, R. Xia, Z. Chen, J. Xiao, X. Zhao, S. Liu, H.-L. Yip, Y. Cao, "Overcoming space-charge effect for efficient thick-film non-fullerene organic solar cells," Adv. Energy Mater., 1801609 (2018). (URL, PDF)

    60. K. Zhang, B. Fan, R. Xia, X. Liu, Z. Hu, H. Gu, S. Liu, H.‐L. Yip, L. Ying, F. Huang, and Y. Cao, "Highly efficient tandem organic solar cell enabled by environmentally friendly solvent processed polymeric interconnecting layer," Adv. Energy Mater.8, 1703180 (2018). (URL, PDF)

    61. X. Zhou, X. Hu, J. Yu, S. Liu, Z. Shu, Q. Zhang, H. Li, Y. Ma, H. Xu, and T. Zhai, "2D layered material-based van der Waals heterostructuresfor optoelectronics," Adv. Funct. Mater. 28, 1706587 (2018). (URL, PDF)

    62. K. Ding, Y. Fang, S. Dong, H. Chen, B. Luo, K. Jiang, H. Gu, L. Fan, S. Liu, B. Hu, and L. Wang, "24.1% external quantum efficiency of flexible quantum dot light-emitting diodes by light extraction of silver nanowire transparent electrodes," Adv. Opt. Mater., 1800347 (2018). (URL, PDF)

    63. S. Xiang, X. Lv, S. Sun, Q. Zhang, Z. Huang, R. Guo, H. Gu, S. Liu, and L. Wang, "To improve the efficiency of thermally activated delayed fluorescence OLEDs by controlling the horizontal orientation through optimizing stereoscopic and linear structures of indolocarbazole isomers," J. Mater. Chem. C 8, 5812-5820 (2018). (URL, PDF)

    64. F. Quan, G. Zhang, C. Mao, Z. Ai, F. Jia, L. Zhang, H. Gu, and S. Liu, "Efficient light-driven CO2 hydrogenation on Ru/CeO2 catalysts," Catal. Sci. Technol. 8, 6503-6510 (2018). (URL, PDF)

    65. H. Zang, H. Wang, H. Gu, X. Zong, B. Tu, P. Xu, B. Wang, W. Wang, S. Liu, and Z. Fu, "Preparation of transparent MgO·1.8Al2O3 spinel ceramics by aqueous gelcasting, presintering and hot isostatic pressing," J. Eur. Ceram. Soc. 38, 4057-4063 (2018). (URL, PDF)

    66. S. Jiang, C. Huang, H. Gu, S. Liu, S. Zhu, M.-Y. Li, L. Yao, Y. Wu, and G. Zhang, "Ultra uniform Pb0.865La0.09(Zr0.65Ti0.35)O3 thin films with tunable optical properties fabricated via pulsed laser deposition," Materials 11, 525 (2018). (URL, PDF)

    67. X. Chen, H. Gu, H. Jiang, C. Zhang, and S. Liu, "Robust overlay metrology with differential Mueller matrix calculus,"Opt. Express 25(8), 8491-8510 (2017). (URL, PDF)

    68. Y. Shi, X. Chen, Y. Tan, H. Jiang, and S. Liu, "Reduced-basis boundary element method for fast electromagnetic field computation," J. Opt. Soc. Am. A 34, 2231-2242 (2017). (URL, PDF)

    69. Z. Tao, X. Chen, H. Jiang, C. Zhang, and S. Liu, "Polarization multiplexed all-dielectric metasurfaces for wavefront manipulation in a transmission mode," J. Opt. 19, 105102 (2017). (URL, PDF

    70. X. Kang, W. Cai, H. Gu, S. Liu, and S. Cui, "A facile and environment-friendly method for fabrication of polymer brush,"Chin. J. Polym. Sci. 35(7), 857-865  (2017). (URL, PDF)

    71. D. Xie, Z. R. Qiu, L. Wan, D. N. Talwar, H.-H. Cheng, S. Liu, T. Mei, and Z. C. Feng, "Spectroscopic ellipsometry and X-ray diffraction  studies on Si1-xGex/Si epifilms and superlattices," Appl. Surf. Sci. 421, 748-754 (2017).(URL,PDF)

    72. X. Chen, Y. Shi, H. Jiang, C. Zhang, and S. Liu, "Nondestructive analysis of lithographic patterns with natural line edge roughness from Mueller matrix ellipsometric data,"Appl .Surf. Sci. 388, 524-530 (2016). (URL, PDF)

    73. K. Zhang, K. Gao, R. Xia, Z. Wu, C. Sun, J. Cao, L. Qian, W. Li, S. Liu, F. Huang, X. Peng, L. Ding, H.-L. Yip, and Y. Cao, "High-performance polymer tandem solar cells employing a new n-type conjugated polymer as an interconnecting layer," Adv. Mater.28(24), 4817-4823 (2016). (URL, PDF)

    74. X. Chen, W. Du, K. Yuan, J. Chen, H. Jiang, C. Zhang, and S. Liu, "Development of a spectroscopic Mueller matrix imaging ellipsometer for nanostructure metrology," Rev. Sci. Instrum. 87(5), 053707 (2016). (URL, PDF)

    75. J. Zhu, Y. Shi, L. L.  Goddard, and S. Liu, "Application of measurement configuration  optimization for accurate metrology of sub-wavelength dimensions in multilayer  gratings using optical scatterometry," Appl.  Opt. 55(25), 6844-6849 (2016). (URL, PDF)

    76. H. Gu, X. Chen, H. Jiang, C. Zhang, W. Li, and S. Liu, "Accurate alignment of optical axes of a biplate using a spectroscopic Mueller matrix ellipsometer," Appl. Opt. 55(15), 3935-3941 (2016). (URL, PDF)

    77. W. Li, H. Jiang, C. Zhang, X. Chen, H. Gu, and S. Liu, "Characterization of curved surface layer by Mueller matrix ellipsometry,” J. Vac. Sci. Technol. B 34(2), 020602 (2016). (URL, PDF)

    78. W. Li, C. Zhang, H. Jiang, X. Chen, and S. Liu, "Depolarization artifacts in dual rotating compensator Mueller matrix ellipsometry," J. Opt. 18(5), 055701 (2016). (URL, PDF)

    79. H. Gu, X. Chen, H. Jiang, C. Zhang, and S. Liu, " Optimal broadband Mueller matrix ellipsometer using multi-waveplates with flexibly oriented axes," J. Opt. 18(2), 025702 (2016). (URL, PDF)

    80. J. Zhu, H. Jiang, Y. Shi, X. Chen, C. Zhang, and S. Liu, "Improved nanostructure reconstruction by performing data refinement in optical scatterometry," J. Opt. 18(1), 015605 (2016). (URL, PDF)

    81. X. Chen, K. Yuan, W. Du, J. Chen, H. Jiang, C. Zhang, and S. Liu, "Large-scale nanostructure metrology using Mueller matrix imaging ellipsometry," Acta Phys. Sin. 65(7), 070703 (2016). (URL, PDF)

    82. Z. Tao, J. Liu, C. Zhang, X. Chen, H. Jiang, and S. Liu, "Compact polarized spectrometer based on spatial modulation of polarization state,"  J. Infrared Millim. Waves 35(5),557-563 (2016). (URL, PDF)

    83. Z. Dong, S. Liu, X. Chen, Y. Shi, C. Zhang, and H. Jiang, "Optimization of measurement configuration in optical scatterometry for one-dimensional nanostructures based on sensitivity analysis," J. Infrared Millim. Waves 35(1), 116-122 (2016). (URL, PDF)

    84. X. Chen, H. Jiang, C. Zhang, and S. Liu, "Towards understanding the detection of profile asymmetry from Mueller matrix differential decomposition," J. Appl. Phys. 118(22), 225308 (2015). (URL, PDF)

    85. S.    Liu, W. Du, X. Chen, H. Jiang, and C.  Zhang, "Mueller matrix imaging   ellipsometry for nanostructure metrology," Opt. Express 23(13),   17316-17329 (2015). (URL, PDF)

    86. S.  Liu, X.  Chen, and C.  Zhang, "Development of a broadband Mueller matrix ellipsometer as a powerful tool for nanostructure metrology," Thin Solid Films 584, 176-185 (2015). (URL, PDF)

    87. J. Zhu, S. Liu, H. Jiang, C.  Zhang, and X.  Chen, "Improved deep-etched multilayer grating reconstruction by considering etching anisotropy and abnormal errors in optical scatterometry," Opt. Lett. 40(4), 471-474 (2015). (URL, PDF)

    88. J.  Zhu, H. Jiang, Y.  Shi, C.  Zhang, X.  Chen, and S.  Liu, "Fast and accurate solution of inverse problem in optical scatterometry using heuristic search and robust correction," J. Vac. Sci. Technol. B 33(3), 031807 (2015).  (URL, PDF)

    89. H.  Gu, S.  Liu, X.  Chen, and C.  Zhang, "Calibration of misalignment errors in composite waveplates using Mueller matrix ellipsometry," Appl. Opt. 54(4), 684-693 (2015). (URL, PDF)

    90. Y. Zhang, X. Zhou, K. Cao, X. Chen, Z. Deng, S. Liu, B. Shan, and R. Chen, "Ellipsometry study on Pd thin film grown by atomic layer deposition with Maxwell-Garnett effective medium approximation model," Thin Solid Films 593, 144-149 (2015). (URL, PDF)

    91. X. Wu, S. Liu, W. Lv, and E. Y. Lam, "Sparse nonlinear inverse imaging for shot count reduction in inverse lithography," Opt. Express 23(21), 26919-26931 (2015).  (URL, PDF)

    92. T.  Sun, Z.  Xu, H.  Xu, W.  Zhao, X.  Wu, S.  Liu, Z.  Ma, J. He, S.  Liu, and J. Peng, "Direct tailoring the Si substrate for antireflection via random nanohole nanoimprint," J. Nanosci. Nanotechnol. 15(2), 1297-1303 (2015). (URL, PDF)

    93. X.  Chen, C.  Zhang, S.  Liu, H. Jiang, Z.  Ma, and Z.  Xu, "Mueller matrix ellipsometric detection of profile asymmetry in nanoimprinted grating structures," J. Appl. Phys. 116(19), 194305 (2014). (URL, PDF)

    94. J.  Zhu, S.  Liu, X.   Chen, C.  Zhang, and H. Jiang, "Robust solution to the inverse problem in  optical scatterometry," Opt. Express 22(18), 22031-22042 (2014). (URL, PDF)

    95. X.  Chen, S.  Liu, C.  Zhang,  H. Jiang, Z.  Ma, T.  Sun, and Z.  Xu, "Accurate characterization of  nanoimprinted resist patterns using Mueller matrix ellipsometry," Opt. Express 22(12), 15165-15177  (2014). (URL, PDF)

    96. S. Xu, C.  Zhang, H.  Wei, and S.  Liu, "A  single-image method of aberration retrieval for imaging systems under partially  coherent illumination," J. Opt. 16(7), 072001 (2014). (URL, PDF)

    97. X.  Chen, S.  Liu, H.   Gu, and C.  Zhang, "Formulation of error propagation and estimation in  grating reconstruction by a dual-rotating compensator Mueller matrix polarimeter," Thin Solid Films 571, 653-659 (2014). (URL, PDF)

    98. Z.  Dong, S.  Liu, X.  Chen, and C.   Zhang, "Determination of an optimal measurement configuration in optical  scatterometry using global sensitivity analysis," Thin Solid Films 562, 16-23 (2014). (URL, PDF)

    99. W. Lv, E. Y. Lam, H.  Wei, and S.  Liu, "Cascadic  multigrid algorithm for robust inverse mask synthesis in optical lithography," J. Micro/Nanolith. MEMS MOEMS 13(2), 023003  (2014). (URL, PDF)

    100. W. Lv, S.  Liu, X.  Wu, and E. Y. Lam, "Illumination source optimization in optical lithography via derivative-free optimization," J. Opt. Soc. Am. A 31(12), B19-B26 (2014).  (URL, PDF)

    101. X.  Zhou, C.  Zhang, H.  Jiang, H.  Wei, and S.  Liu, "Efficient representation of mask transmittance functions for vectorial lithography simulations," J. Opt. Soc. Am. A 31(12), B10-B18 (2014). (URL, PDF)

    102. X.  Wu, S.  Liu, W. Lv, and E. Y. Lam, "Robust and efficient inverse mask synthesis with basis function representation," J. Opt. Soc. Am. A 31(2), B1-B9 (2014).  (URL, PDF)

    103. X.  Wu, S.  Liu, J. Li, and E. Y. Lam, "Efficient  source mask optimization with Zernike polynomial functions for source  representation," Opt. Express 22(4),  3924-3937 (2014). (URL, PDF)

    104. H. Long, T.  Shi, S.  Jiang, S. Xi, R. Chen,  S.  Liu, G.  Liao, and Z.  Tang, "Synthesis of a nanowire self-assembled  hierarchical ZnCo2O4 shell/Ni current collector core as binder-free anodes for  high-performance Li-ion batteries," J.  Mater. Chem. A 2(11), 3741-3748 (2014). (URL, PDF)

    105. X.  Wu, Z.  Xu, B.  Liu, T.  Sun, W.   Zhao, S.  Liu, Z.  Ma, F. Zhao, S.  Wang, X.  Zhang, S.  Liu, and J.  Peng, "Effect of cation and anion defects on the resistive switching polarity  of ZnOx thin films," Appl. Phys. A 114(3),  847-852 (2014). (URL, PDF)

    106. T.  Sun, W.  Zhao, X.  Wu, S.  Liu, Z.   Ma, J. Peng, J. He, H.  Xu, S.  Liu, and Z.  Xu, "Porous  light-emitting diodes with patterned sapphire substrates realized by  high-voltage self-growth and soft UV nanoimprint processes," J. Lightwave. Technol. 32(2), 326-332  (2014). (URL, PDF)

    107. S.  Liu, "Computational metrology: Problems  and solution methods," J. Mech. Eng. 50(4), 1-10 (2014). (URL, PDF)

    108. X.  Chen, S.  Liu, C.  Zhang, Y.  Wu, Z.   Ma, Y.  Sun, and Z.  Xu, "Accurate measurement of templates and  imprinted grating structures using Mueller matrix ellipsometry," Acta. Phys. Sin. 63(18), 180701 (2014).  (URL, PDF)

    109. Z.  Ma, Z.  Xu, J. Peng, T.  Sun, X.   Chen, W.  Zhao, S.  Liu, X.  Wu, C. Zou, and S.  Liu, "Nondestructive  detection of nano grating by generalized ellipsometer," Acta. Phys. Sin. 63(3), 039101 (2014). (URL, PDF)

    110. S.  Liu, X.  Zhou, W. Lv, S. Xu, and H.   Wei, "Convolution-variation separation method for efficient modeling of optical  lithography," Opt. Lett. 38(13),  2168-2170 (2013). (URL, PDF)

    111. X.  Chen, C.  Zhang, and S.  Liu, "Depolarization  effects from nanoimprinted grating structures as measured by Mueller matrix  polarimetry," Appl. Phys. Lett. 103(15), 151605 (2013). (URL, PDF)

    112. W. Lv, Q. Xia, and S.  Liu, "Mask-filtering-based  inverse lithography," J. Micro/Nanolith.  MEMS MOEMS 12(4), 043003 (2013). (URL, PDF)

    113. X.  Chen, S.  Liu, C.  Zhang, and H. Jiang,  "Improved measurement accuracy in optical scatterometry using correction-based  library search," Appl. Opt. 52(27),  6727-6734 (2013). (URL, PDF)

    114. X.  Chen, S.  Liu, C.  Zhang, and H. Jiang,  "Measurement configuration optimization for accurate grating reconstruction by  Mueller matrix polarimetry," J.  Micro/Nanolith. MEMS MOMES 12(3), 033013 (2013). (URL, PDF)

    115. W. Lv, S.  Liu, Q. Xia, X.  Wu, Y.  Shen,  and E. Y. Lam, "Level-set-based inverse lithography for mask synthesis using  the conjugate gradient and an optimal time step," J. Vac. Sci. Technol. B 31(4), 041605 (2013). (URL, PDF)

    116. X.  Chen, S.  Liu, C.  Zhang, and J.   Zhu, "Improved measurement accuracy in optical scatterometry using fitting  error interpolation based library search," Measurement 46(8), 2638-2646 (2013). (URL, PDF)

    117. J.  Zhu, S.  Liu, C.  Zhang, X.  Chen, and  Z.  Dong, "Identification and reconstruction of diffraction structures in  optical scatterometry using support vector machine method," J. Micro/Nanolith. MEMS MOEMS 12(1), 013004  (2013). (URL, PDF)

    118. P. Zhang, S.  Liu, and H. Lv, "Fabrication and  properties of dual-level hierarchical structures mimicking gecko foot hairs," J. Nanosci. Nanotechnol. 13(2), 781-786  (2013). (URL, PDF)

    119. J. Li, S.  Liu,  and E. Y. Lam, "Efficient source and mask  optimization with augmented Lagrangian methods in optical lithography," Opt. Express 21(7), 8076-8090 (2013). (URL, PDF)

    120. H. Jiang, B. Yang, and S.  Liu, "Effects of  transverse shear on strain stiffening of biological fiber networks," CMC-Comput. Mater. Con. 38(2), 61-77  (2013). (URL, PDF)

    121. Q. Xia, T.  Shi, S.  Liu, and M.  Wang, "Shape  and topology optimization for tailoring stress in a local region to enhance  performance of piezoresistive sensors," Comput.  Struct. 114-115, 98-105 (2013). (URL, PDF)

    122. Q. Xia, T.  Shi, S.  Liu, and M.  Wang, "Optimization  of stresses in a local region for the maximization of sensitivity and  minimization of cross-sensitivity of piezoresistive sensors," Struct. Multidisc. Optim. 48(5), 927-938  (2013). (URL, PDF)

    123. W. Zhu, T.  Shi, Z.  Tang, B. Gong, G.   Liao, and S.  Liu, "Numerical  analysis of transmission efficiency for parabolic optical fiber nano-probe," Opt. Express 21(23), 28103-28110 (2013). (URL, PDF)

    124. T.  Sun, Z.  Xu, W.   Zhao, X.  Wu, S.  Liu, Z. Zhang, S.  Wang, W. Liu, S.  Liu, and J. Peng,  "Fabrication of the similar porous alumina silicon template for soft UV  nanoimprint lithography," Appl. Surf.  Sci. 276, 363-368 (2013). (URL, PDF)

    125. T.  Sun, Z.  Xu, H.  Xu, W.  Zhao, X. Wu, S.  Liu, Z.  Ma, J. He, S.  Liu, and J. Peng. "Photonic crystal structures on nonflat surfaces fabricated by dry lift-off soft UV nanoimprint lithography," J. Micromech. Microeng. 23(12), 125002 (2013). (URL, PDF)

    126. Z. Zhang, Z.  Xu, T.  Sun, J. He, H.  Xu,  X.  Zhang, and S.  Liu, "The fabrication of the antireflective periodic  nano-arrary structure on Si surface using nanoimprint lithography and the study  on its properties," Acta. Phys. Sin. 62(16), 168102 (2013). (URL, PDF)

    127. S.   Liu, S. Xu, X.  Wu, and W. Liu, "Iterative method for in situ measurement  of lens aberrations in lithographic tools using CTC-based quadratic aberration  model," Opt. Express 20(13), 14272-14283  (2012). (URL, PDF)

    128. H.   Wei and S.  Liu, "Comment on ‘Three-dimensional imaging of a phase object  from a single sample orientation using an optical laser’," Phys. Rev. B 86(22), 226101 (2012). (URL, PDF)

    129. P. Gong, S.  Liu, W. Lv, and X.  Zhou, "Fast aerial image  simulations for partially coherent systems by transmission cross coefficient  decomposition with analytical kernels," J.  Vac. Sci. Technol. B 30(6), 06FG03 (2012). (URL, PDF)

    130. S.   Liu, Y. Ma, X.  Chen, and C.  Zhang, "Estimation of the convergence  order of rigorous coupled-wave analysis for binary gratings in optical critical  dimension metrology," Opt. Eng. 51(8), 081504 (2012). (URL, PDF)

    131. S.   Liu, W. Liu, X.  Zhou, and P. Gong, "Kernel-based parametric analytical  model of source intensity distributions in lithographic tools," Appl. Opt. 51(10), 1479-1486 (2012). (URL, PDF)

    132. S.   Liu, P. Zhang, H. Lv, C. W. Zhang, and Q. Xia, "Fabrication of high aspect  ratio microfiber arrays that mimic gecko foot hairs," Chin. Sci. Bull. 57(4), 404-408 (2012). (URL, PDF)

    133. Q. Xia,  T.  Shi, S.  Liu, and M.  Wang, "A level set solution to the stress-based  structural shape and topology optimization," Comput. Struct. 90-91, 55-64 (2012). (URL, PDF)

    134. H. Long,  S. Xi, D. Liu, T.  Shi, Q. Xia, S.  Liu, and Z.  Tang, "Tailoring  diffraction-induced light distribution toward controllable fabrication of  suspended C-MEMS," Opt. Express 20(15), 17126-17135 (2012). (URL, PDF)

    135. D. Liu,  T.  Shi, S. Xi, W.  Lai, S.  Liu, X.  Li, and Z.  Tang, "Concentration  gradient induced morphology evolution of silica nanostructure growth on  photoresist-derived carbon micropatterns," Nanoscale  Res. Lett. 7(9), 496 (2012). (URL, PDF)

    136. S. Xi,  T.  Shi, L.  Xu, Z.  Tang, D. Liu, X.  Li, and S.  Liu, "Metal-catalyst-free  synthesis and characterization of single-crystalline silicon oxynitride  nanowires," J. Nanomater. 2012,  620475 (2012). (URL, PDF)

    137. S.  Liu, X.  Wu, W. Liu, and C.  Zhang, "Fast aerial image  simulations using one basis mask pattern for optical proximity correction," J. Vac. Sci. Technol. B 29(6), 06FH03 (2011). (URL, PDF)

    138. S.  Liu, W. Liu, and X.  Wu, "Fast evaluation of aberration-induced  intensity distribution in partially coherent imaging systems by cross triple  correlation," Chin. Phys. Lett. 28(10), 104212 (2011). (URL, PDF)

    139. S.  Liu, W. Liu, and T.  Zhou, "Fast algorithm for quadratic  aberration model in optical lithography based on cross triple correlation," J. Micro/Nanolith. MEMS MOEMS 10(2),  023007 (2011). (URL, PDF)

    140. S.  Liu, P. Zhang, X. Cheng, R. Malik, and Z.  Tang, "Optimal design  of high-aspect-ratio micro/nano hierarchical structures mimicking gecko  foot-hairs," Adv. Sci. Lett. 4(4),  1546-1551 (2011). (URL, PDF)

    141. C.  Zhang, S.  Liu, T.  Shi, and Z.  Tang, "Fitting-determined  formulation of effective medium approximation for 3D trench structures in  model-based infrared reflectrometry," J.  Opt. Soc. Am. A 28(2), 263-271 (2011). (URL, PDF)

    142. W. Liu, S.  Liu, X.  Wu, and C.  Zhang, "Parametric analytical  model for off-axis illumination sources based on Sigmoid function," Acta. Phys. Sin. 60(5), 054213 (2011) (URL, PDF)

    143. W. Ma, T.  Shi, Z.  Tang, S.  Liu, R. Malik, and L. Zhang, "High-throughput  dielectrophoretic manipulation of bioparticles within fluids through  biocompatible three-dimensional microelectrode array," Electrophoresis 32(5), 494-505 (2011). (URL, PDF)

    144. R. Malik, T.  Shi, Z.  Tang, S.  Liu, "Effect of ultra violet  process and annealing on reliability in low temperature silicon wafer direct  bonding," Adv. Sci. Lett. 4(3),  774-780 (2011). (URL, PDF)

    145. Q. Xia, T.  Shi, M.  Wang, and S.  Liu, "Simultaneous  optimization of cast part and parting direction using level set method," Struct. Multidisc. Optim. 44(6), 751-759  (2011). (URL, PDF)

    146. Z.   Tang, R. Malik, J. Gong, T.  Shi, and S.  Liu, "Optimal design of 3-D carbon  microelectrode array for dielectrophoretic manipulation of nanoparticles in fluids," J. Nanosci. Nanotechnol. 11(12), 10433-10437 (2011). (URL, PDF)

    147. W.  Liu, S.  Liu, T.  Shi, and Z.  Tang, "Generalized formulations for aerial  image based lens aberration metrology in lithographic tools with arbitrarily  shaped illumination sources," Opt.  Express 18(19), 20096-20104 (2010). (URL, PDF)

    148. Z.   Tang, R. Malik, T.  Shi, X.  Wang, P. Peng, X.  Li, W.  Lai, and S.    Liu, "Analytical modeling of wetting  dependence on surface nanotopography," Thin  Solid Films 519(4), 1387-1390 (2010). (URL, PDF)

    149. Z.   Tang, T.  Shi, J. Gong, L. Nie, and S.  Liu, "An optimized process for  fabrication of high-aspect-ratio photoresist-derived carbon microelectrode  array on silicon substrate," Thin Solid  Films 518(10), 2701-2706 (2010). (URL, PDF)

    150. Q.  Xia, T.  Shi, M.  Wang, and S.  Liu, "A level set based method for the  optimization of cast part," Struct.  Multidisc. Optim. 41(5), 735-747 (2010). (URL, PDF)

    151. W. Liu,  S.  Liu, T.  Zhou, and L.  Wang, "Aerial image based technique for  measurement of lens aberrations up to 37th Zernike coefficient in lithographic  tools under partial coherent illumination," Opt.  Express 17(21), 19278-19291 (2009). (URL, PDF)

    152. C.   Zhang, S.  Liu, T.  Shi, and Z.  Tang, "Improved model-based infrared  reflectrometry for measuring deep trench structures," J. Opt. Soc. Am. A 26(11), 2327-2335 (2009). (URL, PDF)

    153. Z.   Tang, P. Peng, T.  Shi, G.  Liao, L. Nie, and S.  Liu, "Effect of  nanoscale surface topography on low temperature direct wafer bonding process  with UV activation," Sensor. Actuat. A 151(1), 81-86 (2009). (URL, PDF)

    154. S.   Liu, C.  Zhang, H.  Shen, and H.  Gu, "Model-based FTIR reflectometry  measurement system for deep trench structures of DRAM," Spectrosc. Spect. Anal. 29(4), 935-939 (2009).    (URL, PDF)

    155. Z.  Tang, T.  Shi, G.  Liao, and S.  Liu,  "Modeling the formation of spontaneous wafer direct bonding under low  temperature," Microelectron. Eng. 85,  1754-1757 (2008). (URL, PDF)

    156. S.   Liu, H.  Gu, C.  Zhang, and H.  Shen, "A fast algorithm for reflectivity calculation of  micro/nano deep trench structures by corrected effective medium approximation," Acta. Phys. Sin. 57(9), 5996-6001 (2008). (URL, PDF)



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Conference Presentations

Conference Presentations

  1. H. Gu, H. Jiang, C. Zhang, X. Chen, and S. Liu, "Optimal design of wide-view-angle waveplate used for polarimetric diagnosis of lithography system," Presented at SPIE Advanced Lithography, San Jose, USA, February 21-25, 2016, in Proc. SPIE 9780, 97801M (2016).(URL, PDF)

  2. X. Ke, H. Jiang, W. Lv, and S. Liu, "Native conflict awared layout decomposition in triple patterning lithography using bin-based library matching method," Presented at SPIE Advanced Lithography, San Jose, USA, February 21-25, 2016, in Proc. SPIE 9780, 97801F (2016).(URL, PDF)

  3. X. Wu, S. Liu, A. Erdmann, and E. Y. Lam, "Incorporating photomask shape uncertainty in computational lithography," Presented at SPIE Advanced Lithography, San Jose, USA, February 21-25, 2016, in Proc. SPIE 9780, 97800Q (2016).(URL, PDF)

  4. J. Zhu, Y. Shi, S. Liu, and L. L. Goddard, "Generalized measurement configuration optimization for accurate reconstruction of periodic nanostructures using optical scatterometry," Presented at SPIE Advanced Lithography, San Jose, USA, February 21-25, 2016, in Proc. SPIE 9778, 977823 (2016). (URL, PDF)

  5. W. Li, C. Zhang, H. Jiang, X. Chen, H. Gu, and S. Liu, "Correction of depolarization effect in Mueller matrix ellipsometry with polar decomposition method," Presented at SPIE Optical Metrology, Munich, Germany, June 22-25, 2015, in Proc. SPIE 9526, 952619 (2015).(URL, PDF)

  6. H. Gu, C. Zhang, H. Jiang, X. Chen, W. Li, and S. Liu, "Measurement errors induced by axis tilt of biplates in dual-rotating compensator Mueller matrix ellipsometers," Presented at SPIE Optical Metrology, Munich, Germany, June 22-25, 2015, in Proc. SPIE 9526, 952617 (2015). (URL, PDF)

  7. X. Ke, W. Lv, and, and S. Liu, "Ant colony algorithm for layout decomposition in double/multiple patterning lithography," Presented at 2015 China Semiconductor Technology International Conference (CSTIC), Shanghai, China, March 15-16, 2015, in Proceedings, pp. 1-3 (2015). (URL, PDF)

  8. J.  Zhu, H. Jiang, C.  Zhang, X.  Chen, and S.  Liu, " Data refinement for robust solution to the inverse problem in optical scatterometry," Presented at SPIE Advanced Lithography, San Jose, USA, February 22-26, 2015, in Proc. SPIE 9424, 94290Y (2015). (URL, PDF)

  9. S.  Liu, X.  Chen, and C.  Zhang, "Mueller  matrix polarimetry: A powerful tool for nanostructure metrology," Presented at 2014  China Semiconductor Technology International Conference (CSTIC), Shanghai,  China, March 16-17, 2014,  in ECS Trans. 60(1), 237-242 (2014).  (Invited speech) (URL, PDF)

  10. W. Lv, H.  Wei, and S.  Liu, "Efficient and  robust synthesis of phase-shifting masks in optical lithography," Presented at 2014  China Semiconductor Technology International Conference (CSTIC), Shanghai,  China, March 16-17, 2014,  in ECS Trans. 60(1), 1225-1230 (2014).  (Best student award paper) (URL, PDF)

  11. W. Lv, S.  Liu, X.  Zhou, and H.  Wei,  "Effective simulation for robust inverse lithography using  convolution-variation separation method," Presented at SPIE Advanced  Lithography, San Jose, USA, February  23-27, 2014, in Proc. SPIE 9052,  90522C (2014). (URL, PDF)

  12. W.  Li, C.  Zhang, X.  Chen, H.  Gu, and  S.  Liu, "Mueller matrix polarimeter with imperfect compensators: calibration  and correction," Presented at OSA Meeting on Computational Optical Sensing and  Imaging (COSI), Kohala Coast, USA, June 22-26, 2014, in OSA Technical Digest, paper CW3C.3  (2014). (URL, PDF)

  13. W.  Du, C. W. Zhang, X.  Chen, H.  Gu, and  S.  Liu, "Depolarization effect of bandwidth in Mueller matrix imaging  polarimetry," Presented at OSA Meeting on Computational Optical Sensing and  Imaging (COSI), Kohala Coast, USA, June 22-26, 2014, in OSA Technical Digest, paper CW4C.5  (2014). (URL, PDF)

  14. S.  Liu, "Computational metrology for  nanomanufacturing," Presented at the 6th International Symposium on Precision  Mechanical Measurement (ISPMM), Guiyang,  China, August 8-10, 2013, in Proc. SPIE 8916, 891606 (2013). (Invited speech) (URL, PDF)

  15.             W.  Li, S.  Liu, C.  Zhang, X.  Chen, and H.  Gu, "Correction on the effect of numerical aperture in optical scatterometry," Presented at the 6th International Symposium on Precision  Mechanical Measurement (ISPMM), Guiyang,  China, August 8-10, 2013, in Proc. SPIE, 8916, 89162I (2013). (URL, PDF)

  16. W. Lv, Q. Xia and S.  Liu, "Pixel-based  inverse lithography using a mask filtering technique," Presented at SPIE Advanced  Lithography, San Jose, USA, February  24-28, 2013, in Proc.  SPIE 8683, 868325 (2013). (URL, PDF)

  17. X.  Chen, S.   Liu, C.  Zhang, and H. Jiang, "Measurement  configuration optimization for grating reconstruction by Mueller matrix  polarimetry," Presented at SPIE Advanced  Lithography, San Jose, USA, February 24-28, 2013, in Proc. SPIE 8681,  86812B (2013). (URL, PDF)

  18. W.  Li, S.  Liu, C.  Zhang, and X.  Chen,  "Reduction of measurement errors with two-channel configuration in the Mueller  matrix ellipsometer," Presented at the 8th International Symposium on Precision  Engineering Measurement and Instrumentation (ISPEMI), Chengdu, China, August  7-9, 2013, in Proc.  SPIE 8759, 875954 (2013). (URL, PDF)

  19. H.  Gu, S.   Liu, X.  Chen, and C.   Zhang, "Analysis and extraction of misalignment errors in a three-in-one  composite wave-plate with an equivalent fast axis," Presented  at the 8th International Symposium on Precision Engineering Measurement and Instrumentation  (ISPEMI), Chengdu, China, August 7-9, 2013, in Proc. SPIE 8759,  87593C (2013). (URL, PDF)

  20. W.  Du, S.  Liu, C.  Zhang, and X.  Chen,  "Optimal configuration for the dual rotating-compensator Mueller matrix  ellipsometer," Presented at the 8th International  Symposium on Precision Engineering Measurement and Instrumentation (ISPEMI),  Chengdu, China, August 7-9, 2013, in Proc.  SPIE 8759, 875925 (2013). (URL, PDF)

  21. Y.  Shi, S.  Liu, J.  Zhu, C.   Zhang, X.  Chen, and Z.  Tang, "Optimal  design of periodic nanostructures formed in solar cells as an  antireflective layer," Presented  at the 8th IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS), Suzhou,  China, April 7-10,  2013, in Proceedings, pp. 524-527  (2013) (URL, PDF )

  22. X.  Wu, S.   Liu, J. Li, and  E. Y. Lam, "Efficient source mask optimization with Zernike polynomial  function-based source representation," Presented at  International Photonics and Optoelectronics Meetings (POEM), Wuhan, China, May 25-26, 2013, in OSA Technical Digest, paper NSa3A.15  (2013). (URL, PDF)

  23. X.  Wu, S.   Liu, S. Xu, X.  Zhou, and W. Liu, "In-situ measurement of lens aberrations in  lithographic tools using CTC-based quadratic aberration model," Presented at SPIE Advanced Lithography, San Jose, USA, February 10-14,  2012, in Proc.  SPIE 8326, 832629 (2012). (URL, PDF)

  24. J.  Zhu, S.  Liu, C.   Zhang, X.  Chen, and Z.  Dong, "Classification and recognition of  diffraction structures using support vector machine in optical scatterometry," Presented at SPIE Advanced Lithography, San  Jose, USA, February 10-14, 2012, in Proc. SPIE 8324, 83242S  (2012). (URL, PDF)

  25. K. Wang, Y. Yan, T.  Shi, S.   Liu, and Q. Xia, "Image registration based on geometric pattern  matching," Presented at  International Workshop on Image Processing and Optical Engineering, Harbin,  China, January 8-9, 2012, in Proc. SPIE 8335, 83351K  (2012). (URL, PDF)

  26. H. Long, D.  Liu,  S. Xi, T.  Shi, S.  Liu, W.  Lai  and Z.  Tang, "Pyrolysis-assisted graphene exfoliation from  graphite particles deposited on photoresist pillars," Presented at the 12th IEEE Conference on Nanotechnology, Birmingham, UK, August 20-23, 2012, in Proceedings,  pp. 1-4 (2012). (URL, PDF)

  27. W.  Liu, T.  Zhou, and S.  Liu, "Fast algorithm for  quadratic aberration model based on cross triple correlation," Presented at SPIE Advanced Lithography, San Jose, USA, February 25-28,  2011, in Proc.  SPIE 7973, 79731M  (2011). (URL, PDF)

  28. Y.  Ma, S.  Liu, X.   Chen, and C.  Zhang, "Estimation of the  convergence order of rigorous coupled-wave analysis for OCD metrology," Presented at the 7th  International Symposium on Precision Engineering Measurements and  Instrumentation (ISPEMI), Lijiang, China, August 6-8, 2011, in Proc. SPIE 8321, 83211M  (2011). (URL, PDF)

  29. S.   Liu, "Computational lithography and computational metrology for  nanomanufacturing," Presented at the 6th IEEE  International Conference on Nano/Micro Engineered and Molecular Systems (NEMS),  Kaohsiung, Taiwan, February  20-23, 2011, in Proceedings, pp. 1093-1099 (2011). (Invited speech) (URL, PDF)

  30. H. Lv, S.  Liu, P. Zhang, and Z.  Tang, "Fabrication of biomimetic gecko setae by direct  photolithography and micromolding processes," Presented at the 6th IEEE International Conference on Nano/Micro Engineered and  Molecular Systems (NEMS), Kaohsiung, Taiwan, February 20-23, 2011, in Proceedings, pp. 503-506 (2011). (URL, PDF)

  31. X.  Chen, S.  Liu, C.   Zhang and Y. Ma, "Zernike representation  of angle-resolved Mueller matrix for dimensional analysis of nanoscale  structures," Presented at the 6th IEEE International Conference on Nano/Micro  Engineered and Molecular Systems, Kaohsiung, Taiwan, February 20-23, in Proceedings, pp. 507-510 (2011). (URL, PDF)

  32. K. Wang, Q. Xia, T.  Shi, G.  Liao and S.  Liu, "A pattern matching method  using geometric information of images," Presented at the 6th IEEE International Conference on Nano/Micro Engineered and  Molecular Systems (NEMS), Kaohsiung, Taiwan, February 20-23, in Proceedings,  pp. 33-36 (2011). (URL, PDF)

  33. X.  Chen, S.  Liu, C.  Zhang, Y. Ma, and J.    Zhu, "Modeling and simulation of through-focus images  for dimensional analysis of nanoscale structures," Presented  at the  6th International Symposium on Precision Engineering Measurement and  Instrumentation (ISPEMI), Hangzhou, China, August 7-9, 2010, in Proc. SPIE 7544, 75446C (2010). (URL, PDF)

  34. X.  Wu, S.  Liu, W. Liu, T.    Zhou, and L.    Wang, "Comparison of three TCC calculation algorithms  for partially coherent imaging simulation," Presented  at the  6th International Symposium on Precision Engineering Measurement and  Instrumentation (ISPEMI), Hangzhou, China, August 7-9, 2010, in Proc. SPIE 7544, 75440Z(2010). (URL, PDF)

  35. C.  Zhang, S.  Liu and T.    Shi, "Modeling of 3-D trench structures with corrected  effective medium approximation for model-based infrared reflectrometry," Presented  at  the 3rd International Nanoelectronics Conference (INEC),  Hong Kong, China, January 3-8, 2010, in Proceedings,  pp. 146-147  (2010). (URL, PDF)

  36. Z.  Tang, J. Gong, R. W. Malik, T. L. Shi, W.    Lai and S.  Liu, "Optimal design of 3-D carbon micro-electrode  array for dielectrophoretic manipulation nanoparticles in fluids," Presented at the 3rd International Nanoelectronics  Conference  (INEC), Hong Kong, China, January 3-8, in Proceedings,  pp. 379-380  (2010). (URL, PDF)

  37. T.  Zhou, S.  Liu, W. Liu,  and L.  Wang, "Influence of partially coherent illumination on  aerial image based aberration measurement of projection optics in lithographic  tools," Presented at 2009 International Conference on Optical Instrument and Technology (OIT), Shanghai, China, October 18-20, 2009, in Proc. SPIE 7511, 751104 (2009). (URL, PDF)

  38. L.  Wang, S.  Liu, W. Liu,  and T.  Zhou, "Optimization of pupil sampling scheme for aerial  image based aberration measurement of projection optics in lithographic tools," Presented  at 2009 International Conference on  Optical Instrument and Technology (OIT), Shanghai, China, October 18-20, 2009, in Proc. SPIE 7511, 751106 (2009). (URL, PDF)

  39. T. Huang, S.  Liu, P.   Yi, and T.  Shi, "Automatic alignment system for optical lithography based on  machine vision," Presented at the 4th International Symposium on  Advanced Optical Manufacturing and Testing Technologies (AOMTT), Chengdu, China, November 18-20, 2009, in Proc. SPIE 7284,  72840I (2009). (URL, PDF)

  40. C.  Zhang, S.  Liu, and T.    Shi, "Metrology of deep trench structures with  polarized FTIR reflectance spectrum," Presented  at  the 4th IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS),  Shenzhen, China, January 5-8, 2009, in Proceedings,  pp. 526-529 (2009). (URL, PDF)

  41. L. Nie, T.    Shi, Z.  Tang, S.  Liu, and G.    Liao, "Low temperature direct bonding for hermetic  wafer level packaging," Presented  at  the 4th IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS),  Shenzhen, China, January 5-8, 2009,  in Proceedings, pp. 467-470 (2009). (URL, PDF)

  42. J. Gong, Z.    Tang, T.  Shi, G.  Liao, L. Nie and S.  Liu, "Improved adhesion between C-MEMS and substrate  by micromechanical interlocking," Presented  at  the 4th IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS),  Shenzhen, China, January 5-8, 2009, in Proceedings,  pp. 619-622 (2009). (URL, PDF)

  43. X.  Li, Z.    Tang, R.  Malik, T.  Shi, W.    Lai, and S.  Liu, "A multi-layer film model for formation mechanism  of bright whiteness in beetle scale," Presented  at 2009  IEEE International Conference on Mechatronics and Automation, Changchun, China, August 9-12, 2009, in Proceedings, pp. 4262-4266 (2009). (URL, PDF)

  44. C.  Zhang, S.  Liu, and T.    Shi, "Metrology of deep trench structures in DRAM  using FTIR reflectance spectrum," Presented  at 2008  International Conference on Optical Instruments and Technology (OIT), Beijing, China, November 15-17, 2008, in Proc.  SPIE 7160, 716017 (2009). (URL, PDF)

  45. T. Huang, S.  Liu, P.  Yi,  and T.  Shi, "Focusing and leveling system for optical  lithography using linear CCD," Presented  at 2008  International Conference on Optical Instruments and Technology (OIT), Beijing, China, November 15-17, 2008, in Proc. SPIE 7160, 71602X  (2009). (URL, PDF)

  46. C.   Zhang, S.  Liu, and T.  Shi,  "MBIR  reflectance spectrometry for deep trench structure with ANN and  Levenberg-Marquardt combined algorithm," Presented at  the 3rd IEEE International Conference on Sensing Technology (ICST), Tainan, Taiwan, November  30-December 3, 2008, in Proceedings,  pp. 234-237 (2008). (URL, PDF)

  47. C.   Zhang, S.  Liu, T.  Shi, and H.   Gu,  "Modeling  and simulation of infrared reflectance spectra of deep trench structures of  DRAM,"  Presented at the  3rd IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS), Sanya, China, January 6-9, 2008, in Proceedings, pp. 227-230 (2008). (URL, PDF)

  48. Z.  Tang, T.    Shi, G.  Liao, P. Peng, L. Nie, and S.    Liu, "Low temperature direct bonding technology for  wafer-scale integration and packaging," Presented  at the  3rd IEEE International Conference on Nano/Micro Engineered and Molecular  Systems (NEMS), Sanya,  China, January 6-9, 2008, in Proceedings,  pp. 95-98 (2008). (URL, PDF)



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Patents

Patents

  1. S.  Liu, H.  Gu, X.  Chen, C.  Zhang, W.  Li, and W.  Du, "Alignment method for optical axes of composite waveplate," United States Patent 2015/0029507 A1 (2015).

  2. S.  Liu, W.  Du, C.  Zhang, and Y.  Tan, "A method and apparatus for rapid measurement of large-area scattering field at nanoscale," China Patent 201410855944.7 (2014).

  3. S.  Liu, X.  Chen, W.  Du, and C.  Zhang, "An apparatus and method for in-line geometrical parameter measurement of large-area nanostructures," China Patent 201410733437.6 (2014).

  4. S.  Liu, S.  Li, W.  Li, C.  Zhang, and W. C. Du, "An automatic adjusting apparatus and control method for illumination intensity in generalized ellipsometers," China Patent 201410594725.8 (2014).

  5. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "Method for extracting critical dimension of semiconductor nanostructure," United States Patent 2013/0325760 A1 (2013).

  6. S.  Liu, S. Xu, P. Gong, X.  Zhou, and W. lv, "A method for lens aberration measurement in lithographic tools," China Patent 201310597584.0 (2013).

  7. S.  Liu, Y.  Shi, X.  Chen, and C.  Zhang, "Method for measuring nanostructures with roughness in optical scatterometry," China patent 201310452328.2 (2013).

  8. S.  Liu, W.  Lv, P. Gong, X.  Zhou, and S. Xu, "A mask optimization method for optical lithography," China patent 201310432991.6 (2013).

  9. S.  Liu, W.  Li, C.   Zhang, and X.  Chen, "Intensity smoothing device and  method for Xeon lamp source in ellipsometers," China patent 201310396574.0 (2013).

  10. S.  Liu, H.  Gu, C.   Zhang, X.  Chen, W.  Li, and W.  Du, "A  quarter-wave-plate retarder," China Patent 201310321074.0 (2013).

  11. S.  Liu, H.  Gu, C.   Zhang, and X.  Chen, "Fresnel lens retarder for  dual-rotating compensator ellipsometers," China Patent 201310320411.4 (2013).

  12. S.  Liu, H.  Gu, X. G. Chen, C.  Zhang, W.  Li, and W.  Du, "Method for composite wave-plate alignment," China Patent 201310320167.1 (2013).

  13. S.  Liu, W.  Du, C.   Zhang, H.  Gu, and S.  Li, "Method for systematic  error estimation and elimination in rotating-compensator ellipsometers," China  Patent 201310302367.4 (2013).

  14. S.  Liu, W.  Du, C.  Zhang, H. Gu, and S.  Li, " Method for systematic parameter optimization in ellipsometers," China Patent 201310302341.X (2013).

  15. S.  Liu, H.  Gu, X.  Chen, C.   Zhang, W.  Li, and W.  Du, "Method for  random error estimation in ellipsometers," China Patent 201310094643.2 (2013).

  16. S.  Liu, W.  Du, C.   Zhang, X.  Chen, J. Chen, and H.  Gu, "A  synchronization system for Mueller matrix ellipsometers," China Patent  201310089535.6 (2013).

  17. S.  Liu, W.  Li, C.   Zhang, and X.  Chen, "A calibration method for systematic  parameters in rotating-component spectroscopic ellipsometers," China Patent  201310040730.X (2013).

  18. S.   Liu, W.  Li, C.   Zhang, and X.  Chen, "A Mueller matrix spectroscopic  ellipsometer and its measurement method," China Patent 201310040729.7 (2013).

  19. S.  Liu, S.  Li, X.  Chen, W.  Li, and C.   Zhang, "A system and method for  alignment of sample stage in optical instruments," China Patent 201210552014.5 (2012).

  20. S.  Liu, J.  Zhu, C.   Zhang, and X.   Chen, "A method for extraction of nanostructure critical dimensions based on improved support vector machine," China Patent 201210545694.8 (2012).

  21. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "A method for measurement uncertainty analysis," China Patent 201210544768.6 (2012).

  22. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "A method for overlay metrology based on Mueller matrix analysis," China Patent  201210544767.1 (2012).

  23. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "A method for improvement of classification accuracy for binary-class support vector machine," China Patent 201210544669.8 (2012).

  24. S.  Liu, X.  Chen, and C.  Zhang, "A library search method for optical scatterometry based on fitting error interpolation," China Patent 201210272215.X (2012).

  25. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "A method for identifying the profile of semiconductor nanostructures," China Patent 201210178809.4 (2012).

  26. S.  Liu, J.  Zhu, C.  Zhang, and X.  Chen, "A method for extracting the critical dimension of semiconductor nanostructures," China Patent 201210177237.8 (2012).

  27. S.  Liu, X.  Chen, H.  Gu, and C.   Zhang, "A method and apparatus for  aligning the optical axes of biplate compensators," China Patent 201110350098.X (2011).


  28. S.  Liu, X.  Chen, H.  Gu, and C.   Zhang, "A clamping apparatus for aligning the optical axes of biplate compensators," China Patent 201110349669.8 (2011).

  29. S.  Liu, C.   Zhang, and X.  Chen, "A fast measurement method and apparatus for  sidewall profiles of micro/nano deep trench structures," China Patent  201010519775.1 (2010).

  30. S.  Liu and P. Zhang, "A focusing method and apparatus for lithographic tools," China Patent 201010519771.3 (2010).

  31. S.  Liu, C.   Zhang, and X.  Chen, "A measurement method and apparatus for  three-dimensional profiles of nanostructures," China Patent 201010223106.X (2010).

  32. S.  Liu, C.   Zhang,  T.  Shi, and X.  Chen, "A measurement method and apparatus for nanoscale dimensional structures," China Patent 201010133464.1 (2010).

  33. S.   Liu, P.  Zhang, and H. Lv, "A fabrication method for a dry adhesive," China Patent 201010171719.3 (2010).

  34. S.  Liu, C.  Zhang, and T.  Shi, "An online measurement method and apparatus for micro/nano deep trench structures," China Patent 200810197279.1 (2008).

  35. S.  Liu, T.  Shi, C.  Zhang, H.  Gu, and H.  Shen, "A measurement method and apparatus for micro/nano deep trench structures," China Patent 200710053292.5 (2007).

  36. S.   Liu, Y. H. Chen, F.  Chi, C. Zhou, and X.  Wei, "Synchronization controller for step and scan projection lithographic tools," China Patent 200710165019.1 (2007).

  37. S.  Liu, Y.  Chen, F Chi, C. Zhou, and X.  Wei, "Synchronization control system for step and scan projection lithographic tools," China Patent 200710165013.4 (2007).

  38. S.   Liu, Y.  Chen, X.  Wei, and F. Chi, "High speed synchronization broadcast bus system  for step and scan projection lithographic tools,"  China Patent 200520023859.5 (2005).

  39. S.  Liu, Y.  Chen, F. Chi, C. Zhou, and X.  Wei, "Synchronization bus control method for step and scan  projection lithographic tools,"  China Patent 200510023858.0 (2005).

  40. S.  Liu, X.  Pei, C. Zhou, and Y.  Chen, "Synchronization  method and system for continuous exposure scan in step and scan projection lithographic  tools," China Patent 200410066384.3 (2004).



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